[JLCS-News:00594] 偏光計測・制御技術研究グル ープ 第8回偏光計測研究会：講 演募集

From: 田所利康
Fri, 27 Apr 2012 11:00:15 +0900
日本液晶学会会員各位
++++++++++++++++++++++++++++++++++++++++++++++++++　
　偏光計測・制御技術研究グループ 第8回偏光計測研究会：講演募集
++++++++++++++++++++++++++++++++++++++++++++++++++　
日本光学会(応用物理学会)「偏光計測・制御技術研究グループ」は、本年6月29日（金）に第8回偏光計測研究会を開催いたします．
偏光の計測・制御は，液晶の基礎研究から液晶デバイスの製品開発に至るあらゆるステージで非常に重要な光学技術です．
液晶研究に携わる皆様方の積極的な講演ご参加を心よりお待ち申し上げます．
また，今回は大変貴重なチュートリアル講演が予定されていますので，聴講ご参加も併せてご検討ください．
発信者：テクノ・シナジー　田所利康（tado@techno-synergy.co.jp）
———————————————————————
偏光計測・制御技術研究グループ 第8回偏光計測研究会：講演募集
　日本光学会 偏光計測・制御技術研究グループでは，毎年2回エリプソメトリーやポラリメトリーに代表される偏光を用いた計測技術および偏光関連技術に関して議論と情報交換場として偏光研究会を開催しています．
　第８回偏光計測研究会を下記の日程で開催いたします．皆様からのご発表を募集いたします．講演内容は、最新の研究成果のみならず、測定技術、解析技術、理論等についてのチュートリアルやレビュー、あるいは、研究動向報告なども歓迎いたします．また、偏光計測を開発・提供している方はもとより、偏光計測をユーザとして利用している方の御発表をお待ちしております。各講演の時間は、質疑応答を含めて15～30分を予定しています．下記の要領で申込をお願いします．
　なお，当日はチュートリアルとしてフランスのEcole Polytechnique,
CNRSからミュラー行列エリプソメトリとイタリアのInstitute of Inorganic Methodologies and of
Plasmas, IMIP-CNRからグラフィンとプラズモニクス：実時間分光偏光計のお話を予定しております．
日時：2012年6月29日金曜日 10：00～17：00
場所：株式会社堀場製作所　東京セールスオフィス
　　　東京都千代田区神田淡路町二丁目６番（神田淡路町二丁目ビル）
http://www.horiba.com/jp/contact-us/worldwide-locations/asia-oceania/japan/horiba-ltd/tokyo-branch/
　午前中は2件のチュートリアル講演，午後は一般講演を予定しております．
参加費：一般3000円，学生1000円
申込締切：５月15日火曜日
申込先： 下記アドレス宛
======== （psi-info@opt.utsunomiya-u.ac.jp） 宛================
●ご氏名：
●ご所属：
●講演タイトル：
申込の際にＡ４, １～２枚の概要をpdfで添付してください
=====================================================
★★　チュートリアルのご案内　★★
　　偏光計測研究会のホームページに詳細があります．
１）Mueller ellipsometry: Basic Principles, Instrumentation and Applications
　　E. Garcia-Caurel, R. Ossikovski, A. de Martino（ LPICM, Ecole Polytechnique, CNRS, France）
Enric GARCIA CAUREL：　Resercher at Ecole Polytechnique since 2003.
Expert in Photonics, Polarization of light – Ellipsometry, Optical properties of materials and Optical instrumentation. He has developed three prototype polarimeters working in different spectral ranges such as the vacuum ultraviolet, the visible or the mid-infrared. His works include theoretical achievements related to the analysis of polarimetric measurements and decomposition of Mueller matrices. He also collaborates to the study and characterization of thin films used for photovoltaic energy production and for low-E windows.His works are interesting for the industry, and he has many contacts with different companies worldwide such HORIBA Scientific, Saint-Gobain or Safran. He has experience in technology transfer to industries and in the filing of patents. An example is the successful development and transfer of a complete polarimeter based in liquid crystal retarders, working in the visible and near infrared spectral range. This polarimeter is commercialized by the company Horiba Scientific under the name AutoSE.
At this moment he is working on the industrialization of a patented broadband spectroscopic Mueller ellipsometer working from the ultraviolet to the mid-infrared spectral range.
He has been involved in more than 5 French research projects, 1 European project. He is author of 2 patents and more than 50 communications to international journals and conferences. He has been invited to participate in 8 PhD dissertation juries. He is a regular reviewer of different international scientific journals such as Optics Express, Applied Optics, and Optics Letters. He is member of different scientific organizations: SPIE, Photonics21 and the French Optical Society. He also serves as Advisor of the local SPIE-OSA Student Chapter “Ecole Polytechnique – Paristech”.
2）Graphene and Plasmonics: the Nanoscale Challenges for Real-time Spectroscopic Ellipsometry
　　Maria Losurdo（Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari, Italy ）
The improvement of technologies towards a more sustainable development and use of energy resources and devices has received an increasing interest worldwide in recent decades. There is consensus that this improvement needs corroborating materials synthesis and device fabrication processes with in-situ real-time characterization.
Elucidating the synthesis-processing-material-functionality interplay is also a key issue in fundamental science, necessary to advance basic knowledge of materials and to manipulate their properties at the nanoscale (i.e., moving towards the 2020 vision of “Materials on demand”).
Spectroscopic Ellipsometry has a long tradition in the science and technology of thin films and surfaces also in situ and in real time,
from which we can benefit for the analysis of materials at the nanoscale.
Therefore, this contribution overviews how spectroscopic ellipsometry, which is a non-destructive, nonintrusive, noninvasive, and contactless optical technique, has evolved into an efficient characterization tool for a large variety of systems ranging from stacked ultrathin layers to semiconductor nanocrystals and metal nanoparticles, and recently to
graphene-based hybrids.
It will include:
-an overview of the fundamentals, limitations, and strategies for the measurements and analysis of nanometric films, metal nanoparticles and semiconductor nanocrystals and periodic structures.
-examples of the applicability of ellipsometry in plasmonics, to understanding the growth of various metal nanoparticles, also in
core-shell configuration, as well as of novel nano-alloys, to tailor their localized surface plasmon resonance.
-examples of the exploitation of ellipsometry to optimize and understand CVD growth (using CH4-H2) of graphene on nickel (Ni) and copper (Cu) and establishing correlations between process kinetics and graphene thickness. It will be shown how the synergy with real-time ellipsometry monitoring allows to understand and improve critica steps in graphene CVD fabrication, including substrate preparation, carbon diffusion kinetics and the impact of the H2/CH4 ratio on CVD growth kinetics, thickness and structural and optical properties of graphene.
Finally, interface chemical and optical phenomena in hybrid nanomaterials created by combinations of graphene, metal nanoparticles, and self assembled monolayers of organic/bio molecules will also be presented, creating a connection to their applications in molecular electronics, photonic, electronic, optical, imaging, catalysis, sensing devices, photovoltaics, and energy savings and storage.
＝＝＝＝＝
なお，過去のプログラムなどは、偏光計測研究会のホームページよりご覧頂け
ます。
http://res.tagen.tohoku.ac.jp/~psi/index.htm
皆様のまわりで、偏光計測関連の方々に適宜転送いただければ幸いです。
日本光学会偏光計測・制御技術研究グループ幹事
宇都宮大学CORE
大谷幸利
—
———————————————-
JLCS-News https://jlcs.jp/information/jlcs-news
発信者：田所利康